Black Matrix (BM)
Photoresist Material Features
- High resolution with precise line-edge control: minimum feature size down to 3.5 µm
- Excellent coating and film-forming stability
- Wide process window
- High compatibility with raw materials and other process materials
- High light-shielding capability
- High electrical resistivity
Photoresist Material Characteristics
- Compatible Equipment: Spin Coater & Slit Coater
- Customizable to meet process requirements
- Stable and well-controlled
- Excellent developer resistance and thermal stability
RGB Color Resist
Applications of Different Color Gamuts
- Web / General Displays: sRGB
- Photography / Printing: Adobe RGB
- Imaging / Cinema / HDR Displays: DCI-P3
- UHD / Future Displays: BT.2020
| CIE 1931 Coverage | Advantages | |
| sRGB | ~35% | No color management required |
| Adobe RGB | ~50% | Better for post-processing |
| DCI-P3 | ~45% | Vivid colors |
| BT. 2020 | ~75% | Future display target |
Over Coat (OC)
The main functions of the Over Coat (OC) Resist are to protect the color filter layer and enhance surface smoothness. In addition, it also serves to isolate the liquid crystal and prevent contamination.
Performance & Characteristics
- High Flatness
- High Chemical Resistance (especially NMP)
- High Transmittance
- Improve PS ER% (Increase 5~10%)
- Low Water Absorption
- Low Temperature Curing (≥150℃)
Other Applications
- PFA_Polymer Film on Array
- High Resolution (Hole ≤7um)
- Touch Panel
- Good Chemical Resistance
- Micro Lens
- Refractive Index (1.63)
Products
| CF OC | PFA | TP OC | HIRF Micro Lens | |
| Curing type | Thermal | Main UV | Main UV | Main UV |
| Material type | Siloxane | Acryl | Acryl | Acryl |
Photo Spacer (PS)
Photo Spacer (PS) This negative type of Photo Spacer (PS) Resist can be used as the spacer for the cell gap in TFT-LCDs.
Its main purpose is to maintain the distance between the LCD panel glass substrates, thereby preventing Mura defects caused by non-uniform liquid crystal thickness.
It enables high-resolution, elastic structures crucial for modern, high-performance displays.
Performance & Characteristics
- High Sensitivity
- High Resolution
- High Uniformity
- High Development Residual Film Rate
- Good Elastic and Plastic Deformation Properties
- Excellent Mechanical Strength
Other Applications
Low Temperature Photoresist
- Lower oven temperature (180ºC)
- ESG implementation
High Thickness Products
- E-paper
- PDLC glass
- Privacy filter
Black Photo Spacer (BPS)
- OD > 1.2/µm, CD~20 µm
Our Product Types
| Normal PS | Fine PS | SuperFine PS | |
| Bottom CD-Top CD (µm) | > 10µm | 7~10 µm | < 6 µm |
| Application | TV / IT | NB / MNT / TPC | MB / Pad / MNT / TPC / AR / VR |
| Elastic Recovery Ratio | Low | Middle | High |
TG-ASeries Positive Photoresist
High Sensitivity & High adhesion property positive resist, Optimized for FPD production. It is formulated with PGMEA and other safe solvent.
Performance & Characteristics
- Resolution: 1.5µm
- High photo sensitivity
- High Dark Erosion/ mura free
- Excellent Uniformity
- Excellent Adhesion on various film
- Excellent Etching Resistance
- Wide process margin
Our Products
| TG-A03 | TG-A25 | TG-A36 | TG-A68 | |
| Viscosity | 15cP | 8cP | 4cP | 3cP |
| Coating Type | Spin | Spin | Slit | Slit |
Process conditions
- Coating Type: Spin or slit
- Viscosity: 3~15 cP
- Pre-bake: 110oC/ 90secoC/ 90sec
- Exposure: i line Aligner (ghi-line)
- Development: 2.38%TMAH
- Post-bake: 140oC/ 3min
膜厚:1um
TG-SSeries Positive Photoresist
High Sensitivity & High adhesion property positive resist, Optimized for Semiconductor production. It is formulated with PGMEA and other safe solvent.
Performance & Characteristics
- High photo sensitivity
- High Dark Erosion
- Excellent Adhesion on various film
- Excellent Adhesion on various film
- Excellent Stripping
- Various viscosity products
Process conditions
- Coating Type: Spin or slit
- Viscosity: 20-115 cP
- Pre-bake: 100oC/ 90sec
- Exposure: i line Aligner (ghi-line)
- Development: 2.38%TMAH
- Post-bake: 140oC/ 5min
Line/Space: 5.0µm
Line/Space: 5.0µm
Line/Space: 2.0µm
Line/Space: 3.0µm
Line/Space: 3.0µm
Our Products
| TG-S01 | TG-S02 | TG-S03 | |
| Viscosity | 20 cP | 50 cP | 115 cP |