Positive Photoresist
Positive tone photoresist is used for the transfer of patterns of the designed layouts in TFT-Array substrate of a TFT-LCD – the functions of positive tone photoresist is to protect some regions of the substrate from chemical attack during the wet or plasma etching process. Regarding resolution, thermal stability, stripping ability and etching resistance, positive tone photoresist is superior to negative tone photoresist.
Reducing the cost, the increase of yield rate and production capacity are essential to the manufacturing of TFT. Besides traditional TFT-Array, the TFT-LCD technology has developed many new territories, e.g., FFS, IPS, and LTPS. The layouts of patterns are much more complicated than traditional ones, and the line width of the patterns are also narrower.
The characteristics of resolution, sensitivity, and film loss of a positive tone photoresist are the keys for the development of those new TFT technologies.
The positive tone photoresist of Topgiga has the advantages listed below:
(1) High resolution, high sensitivity, and low film loss.
(2) High adhesion to various particular purpose-oriented substrates
(3) Good coating properties and critical dimension (CD) uniformity for factories of all generations
(4) Excellent stability of development qualities when recycled development solution is applied.
(5) Good etching resistance
(6) Good for striping
(7) Low Cost
Product Application
A positive tone photoresist is to make the patterns during the etching process. A TFT-LCD of high specification usually has a complicated design of patterns. It is therefore critical to choose a proper positive tone photoresist and to optimize the manufacturing conditions for the increase of yield rate and capacity.
